US Patent Class 257
ACTIVE SOLID-STATE DEVICES (E.G., TRANSISTORS, SOLID-STATE DIODES)-- Main Headings




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Current as of: June, 1999
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CLASS NOTES
1  DF  BULK EFFECT DEVICE {2}
9  DF  THIN ACTIVE PHYSICAL LAYER WHICH IS (1) AN ACTIVE POTENTIAL WELL LAYER THIN ENOUGH TO ESTABLISH DISCRETE QUANTUM ENERGY LEVELS OR (2) AN ACTIVE BARRIER LAYER THIN ENOUGH TO PERMIT QUANTUM MECHANICAL TUNNELING OR (3) AN ACTIVE LAYER THIN ENOUGH TO PERMIT CARRIER TRANSMISSION WITH SUBSTANTIALLY NO SCATTERING (E.G., SUPERLATTICE, QUANTUM WELL, OR BALLISTIC TRANSPORT DEVICE) {5}
40  DF  ORGANIC SEMICONDUCTOR MATERIAL
41  DF  POINT CONTACT DEVICE
42  DF  SEMICONDUCTOR IS SELENIUM OR TELLURIUM IN ELEMENTAL FORM
43  DF  SEMICONDUCTOR IS AN OXIDE OF A METAL (E.G., CuO, ZnO) OR COPPER SULFIDE
44  DF  WITH METAL CONTACT ALLOYED TO ELEMENTAL SEMICONDUCTOR TYPE PN JUNCTION IN NONREGENERATIVE STRUCTURE {3}
48  DF  TEST OR CALIBRATION STRUCTURE
49  DF  NON-SINGLE CRYSTAL, OR RECRYSTALLIZED, SEMICONDUCTOR MATERIAL FORMS PART OF ACTIVE JUNCTION (INCLUDING FIELD-INDUCED ACTIVE JUNCTION) {9}
76  DF  SPECIFIED WIDE BAND GAP (> 1.5eV) SEMICONDUCTOR MATERIAL OTHER THAN GaAsP OR GaAlAs {2}
79  DF  INCOHERENT LIGHT EMITTER STRUCTURE {10}
104  DF  TUNNELING PN JUNCTION (E.G., ESAKI DIODE) DEVICE {2}
107  DF  REGENERATIVE TYPE SWITCHING DEVICE (E.G., SCR, COMFET, THYRISTOR) {19}
183  DF  HETEROJUNCTION DEVICE {10}
202  DF  GATE ARRAYS {4}
212  DF  CONDUCTIVITY MODULATION DEVICE (E.G., UNIJUNCTION TRANSISTOR, DOUBLE-BASE DIODE, CONDUCTIVITY-MODULATED TRANSISTOR)
213  DF  FIELD EFFECT DEVICE {6}
414  DF  RESPONSIVE TO NON-ELECTRICAL SIGNAL (E.G., CHEMICAL, STRESS, LIGHT, OR MAGNETIC FIELD SENSORS) {4}
471  DF  SCHOTTKY BARRIER {8}
487  DF  WITH MEANS TO INCREASE BREAKDOWN VOLTAGE THRESHOLD {6}
497  DF  PUNCHTHROUGH STRUCTURE DEVICE (E.G., PUNCHTHROUGH TRANSISTOR, CAMEL BARRIER DIODE) {1}
499  DF  INTEGRATED CIRCUIT STRUCTURE WITH ELECTRICALLY ISOLATED COMPONENTS {9}
565  DF  BIPOLAR TRANSISTOR STRUCTURE {11}
594  DF  WITH GROOVE TO DEFINE PLURAL DIODES
595  DF  VOLTAGE VARIABLE CAPACITANCE DEVICE {6}
603  DF  AVALANCHE DIODE (E.G., SO-CALLED "ZENER" DIODE HAVING BREAKDOWN VOLTAGE GREATER THAN 6 VOLTS) {2}
607  DF  WITH SPECIFIED DOPANT (E.G., PLURAL DOPANTS OF SAME CONDUCTIVITY IN SAME REGION) {3}
613  DF  INCLUDING SEMICONDUCTOR MATERIAL OTHER THAN SILICON OR GALLIUM ARSENIDE (GaAs) (E.G., PbxSn1-xTe) {3}
617  DF  INCLUDING REGION CONTAINING CRYSTAL DAMAGE
618  DF  PHYSICAL CONFIGURATION OF SEMICONDUCTOR (E.G., MESA, BEVEL, GROOVE, ETC.) {6}
629  DF  WITH MEANS TO CONTROL SURFACE EFFECTS {4}
653  DF  WITH SPECIFIED SHAPE OF PN JUNCTION {1}
655  DF  WITH SPECIFIED IMPURITY CONCENTRATION GRADIENT {2}
658  DF  PLATE TYPE RECTIFIER ARRAY
659  DF  WITH SHIELDING (E.G., ELECTRICAL OR MAGNETIC SHIELDING, OR FROM ELECTROMAGNETIC RADIATION OR CHARGE PARTICLES) {1}
661  DF  SUPERCONDUCTIVE CONTACT OR LEAD {2}
664  DF  TRANSMISSION LINE LEAD (E.G., STRIPLINE, COAX, ETC.)
665  DF  CONTACTS OR LEADS INCLUDING FUSIBLE LINK MEANS OR NOISE SUPPRESSION MEANS
666  DF  LEAD FRAME {10}
678  DF  HOUSING OR PACKAGE {18}
734  DF  COMBINED WITH ELECTRICAL CONTACT OR LEAD {14}
787  DF  ENCAPSULATED {3}
797  DF  ALIGNMENT MARKS
798  DF  MISCELLANEOUS
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CROSS-REFERENCE ART COLLECTIONS
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900  DF  MOSFET TYPE GATE SIDEWALL INSULATING SPACER
901  DF  MOSFET SUBSTRATE BIAS
902  DF  FET WITH METAL SOURCE REGION
903  DF  FET CONFIGURATION ADAPTED FOR USE AS STATIC MEMORY CELL {1}
905  DF  PLURAL DRAM CELLS SHARE COMMON CONTACT OR COMMON TRENCH
906  DF  DRAM WITH CAPACITOR ELECTRODES USED FOR ACCESSING (E.G., BIT LINE IS CAPACITOR PLATE)
907  DF  FOLDED BIT LINE DRAM CONFIGURATION
908  DF  DRAM CONFIGURATION WITH TRANSISTORS AND CAPACITORS OF PAIRS OF CELLS ALONG A STRAIGHT LINE BETWEEN ADJACENT BIT LINES
909  DF  MACROCELL ARRAYS (E.G., GATE ARRAYS WITH VARIABLE SIZE OR CONFIGURATION OF CELLS)
910  DF  DIODE ARRAYS (E.G., DIODE READ-ONLY MEMORY ARRAY)
911  DF  LIGHT SENSITIVE ARRAY ADAPTED TO BE SCANNED BY ELECTRON BEAM (E.G., VIDICON DEVICE)
912  DF  CHARGE TRANSFER DEVICE USING BOTH ELECTRON AND HOLE SIGNAL CARRIERS
913  DF  WITH MEANS TO ABSORB OR LOCALIZE UNWANTED IMPURITIES OR DEFECTS FROM SEMICONDUCTORS (E.G., HEAVY METAL GETTERING)
914  DF  POLYSILICON CONTAINING OXYGEN, NITROGEN, OR CARBON (E.G., SIPOS)
915  DF  WITH TITANIUM NITRIDE PORTION OR REGION
916  DF  NARROW BAND GAP SEMICONDUCTOR MATERIAL (<< 1eV)
917  DF  PLURAL DOPANTS OF SAME CONDUCTIVITY TYPE IN SAME REGION
918  DF  LIGHT EMITTING REGENERATIVE SWITCHING DEVICE (E.G., LIGHT EMITTING SCR) ARRAYS, CIRCUITRY, ETC.
919  DF  ELEMENTS OF SIMILAR CONSTRUCTION CONNECTED IN SERIES OR PARALLEL TO AVERAGE OUT MANUFACTURING VARIATIONS IN CHARACTERISTICS
920  DF  CONDUCTOR LAYERS ON DIFFERENT LEVELS CONNECTED IN PARALLEL (E.G., TO REDUCE RESISTANCE)
921  DF  RADIATION HARDENED SEMICONDUCTOR DEVICE
922  DF  WITH MEANS TO PREVENT INSPECTION OF OR TAMPERING WITH AN INTEGRATED CIRCUIT (E.G., "SMART CARD" ANTI-TAMPER)
923  DF  WITH MEANS TO OPTIMIZE ELECTRICAL CONDUCTOR CURRENT CARRYING CAPACITY (E.G., PARTICULAR CONDUCTOR ASPECT RATIO)
924  DF  WITH PASSIVE DEVICE (E.G., CAPACITOR), OR BATTERY AS INTEGRAL PART OF HOUSING OR HOUSING ELEMENT (E.G., CAP)
925  DF  BRIDGE RECTIFIER MODULE
926  DF  ELONGATED LEAD EXTENDING AXIALLY THROUGH ANOTHER ELONGATED LEAD
927  DF  DIFFERENT DOPING LEVELS IN DIFFERENT PARTS OF PN JUNCTION TO PRODUCE SHAPED DEPLETION LAYER
928  DF  WITH SHORTED PN OR SCHOTTKY JUNCTION OTHER THAN EMITTER JUNCTION
929  DF  PN JUNCTION ISOLATED INTEGRATED CIRCUIT WITH ISOLATION WALLS HAVING MINIMUM DOPANT CONCENTRATION AT INTERMEDIATE DEPTH IN EPITAXIAL LAYER (E.G., DIFFUSED FROM BOTH SURFACES OF EPITAXIAL LAYER)
930  DF  THERMOELECTRIC (E.G., PELTIER EFFECT) COOLING