257 / | HD | ACTIVE SOLID-STATE DEVICES (E.G., TRANSISTORS, SOLID-STATE DIODES) |
|
565 | | BIPOLAR TRANSISTOR STRUCTURE {11} |
566 | DF | .~> Plural non-isolated transistor structures in same structure {2} |
577 | DF | .~> Including additional component in same, non-isolated structure (e.g., transistor with diode, transistor with resistor, etc.) |
578 | DF | .~> With enlarged emitter area (e.g., power device) {4} |
585 | DF | .~> With means to increase inverse gain |
586 | DF | .~> With non-planar semiconductor surface (e.g., groove, mesa, bevel, etc.) |
587 | DF | .~> With specified electrode means {1} |
589 | DF | .~> Avalanche transistor |
590 | DF | .~> With means to reduce minority carrier lifetime (e.g., region of deep level dopant or region of crystal damage) |
591 | DF | .~> With emitter region having specified doping concentration profile (e.g., high-low concentration step) |
592 | DF | .~> With base region having specified doping concentration profile or specified configuration (e.g., inactive base more heavily doped than active base or base region has constant doping concentration portion (e.g., epitaxial base)) |
593 | DF | .~> With means to increase current gain or operating frequency |