| 438 / | HD | SEMICONDUCTOR DEVICE MANUFACTURING: PROCESS |
|
| 689 | DF | CHEMICAL ETCHING {6} |
| 745 |  | .~ Liquid phase etching {9} |
| 746 | DF | .~.~> Utilizing electromagnetic or wave energy |
| 747 | DF | .~.~> With relative movement between substrate and confined pool of etchant |
| 748 | DF | .~.~> Projection of etchant against a moving substrate or controlling the angle or pattern of projected etchant |
| 749 | DF | .~.~> Sequential application of etchant {1} |
| 752 | DF | .~.~> Germanium |
| 753 | DF | .~.~> Silicon |
| 754 | DF | .~.~> Electrically conductive material (e.g., metal, conductive oxide, etc.) {1} |
| 756 | DF | .~.~> Silicon oxide |
| 757 | DF | .~.~> Silicon nitride |