US PATENT SUBCLASS 438 / 747
.~.~ With relative movement between substrate and confined pool of etchant

Current as of: June, 1999
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438 /   HD   SEMICONDUCTOR DEVICE MANUFACTURING: PROCESS

689  DF  CHEMICAL ETCHING {6}
745  DF  .~ Liquid phase etching {9}
747.~.~ With relative movement between substrate and confined pool of etchant

DEFINITION

Classification: 438/747

With relative movement between substrate and confined pool of etchant:

(under subclass 745) Processes including the step of causing a relative motion between the semiconductor substrate being etched and the liquid phase etchant which is confined by a container.