US PATENT SUBCLASS 438 / 746
.~.~ Utilizing electromagnetic or wave energy

Current as of: June, 1999
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438 /   HD   SEMICONDUCTOR DEVICE MANUFACTURING: PROCESS

689  DF  CHEMICAL ETCHING {6}
745  DF  .~ Liquid phase etching {9}
746.~.~ Utilizing electromagnetic or wave energy

DEFINITION

Classification: 438/746

Utilizing electromagnetic or wave energy:

(under subclass 745) Processes wherein the liquid phase etching is conducted using irradiation of electromagnetic or wave energy.