US PATENT SUBCLASS 438 / 748
.~.~ Projection of etchant against a moving substrate or controlling the angle or pattern of projected etchant

Current as of: June, 1999
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438 /   HD   SEMICONDUCTOR DEVICE MANUFACTURING: PROCESS

689  DF  CHEMICAL ETCHING {6}
745  DF  .~ Liquid phase etching {9}
748.~.~ Projection of etchant against a moving substrate or controlling the angle or pattern of projected etchant

DEFINITION

Classification: 438/748

Projection of etchant against a moving substrate or controlling the angle or pattern of projected etchant:

(under subclass 745) Processes wherein the chemical etchant

is sprayed upon the moving semiconductor substrate or sprayed upon the semiconductor substrate in a specific angle or pattern.