US PATENT SUBCLASS 438 / 756
.~.~ Silicon oxide

Current as of: June, 1999
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438 /   HD   SEMICONDUCTOR DEVICE MANUFACTURING: PROCESS

689  DF  CHEMICAL ETCHING {6}
745  DF  .~ Liquid phase etching {9}
756.~.~ Silicon oxide

DEFINITION

Classification: 438/756

Silicon oxide:

(under subclass 745) Processes wherein the material undergoing wet chemical etching is a compound of silicon and oxygen.