| 204 / | HD | CHEMISTRY: ELECTRICAL AND WAVE ENERGY |
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| 193 | DF | APPARATUS {5} |
| 298.01 | DF | .~ Coating, forming or etching by sputtering {2} |
| 298.02 | DF | .~.~ Coating {13} |
| 298.23 |  | .~.~.~ Moving workpiece or target {6} |
| 298.24 | DF | .~.~.~.~> Indeterminate length moving workpiece |
| 298.25 | DF | .~.~.~.~> Multi-chamber (e.g., including air lock, load/unload chamber, etc.) |
| 298.26 | DF | .~.~.~.~> Plural diverse treatment stations, zones, or coating material source within single chamber |
| 298.27 | DF | .~.~.~.~> Plural modes of movement (e.g., planetary, epicyclic, etc.) |
| 298.28 | DF | .~.~.~.~> Rotational movement |
| 298.29 | DF | .~.~.~.~> Oscillatory movement |