US PATENT SUBCLASS 204 / 298.29
.~.~.~.~ Oscillatory movement

Current as of: June, 1999
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204 /   HD   CHEMISTRY: ELECTRICAL AND WAVE ENERGY

193  DF  APPARATUS {5}
298.01  DF  .~ Coating, forming or etching by sputtering {2}
298.02  DF  .~.~ Coating {13}
298.23  DF  .~.~.~ Moving workpiece or target {6}
298.29.~.~.~.~ Oscillatory movement

DEFINITION

Classification: 204/298.29

Oscillatory movement:

(under subclass 298.23) Apparatus including means for oscillating the target or workpiece.