438 / | HD | SEMICONDUCTOR DEVICE MANUFACTURING: PROCESS |
FOR 149 | DF | INCLUDING FORMING A SEMICONDUCTOR JUNCTION (437/15) {7} |
FOR 150 | DF | .~ Using energy beam to introduce dopant or modify dopant distribution (437/ 16) {5} |
FOR 155 | DF | .~.~ Of semiconductor on insulating substrate (437/21) {14} |
FOR 161 | DF | .~.~.~ Including multiple implantations of same region (437/27) {4} |
FOR 162 | DF | .~.~.~.~ Through insulating layer (437/28) {1} |
FOR 163 | .~.~.~.~.~ Forming field effect transistor (FET) type device (437/29) |