US PATENT SUBCLASS 438 / 948
.~ Radiation resist

Current as of: June, 1999
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438 /   HD   SEMICONDUCTOR DEVICE MANUFACTURING: PROCESS

942  DF  MASKING {6}
948.~ Radiation resist {4}
949  DF  .~.~> Energy beam treating radiation resist on semiconductor
950  DF  .~.~> Multilayer mask including nonradiation sensitive layer
951  DF  .~.~> Lift-off
952  DF  .~.~> Utilizing antireflective layer

DEFINITION

Classification: 438/948

Radiation resist:

Art collection under 942 involving the use of a radiation resist in a masking operation.