US PATENT SUBCLASS 438 / 951
.~.~ Lift-off

Current as of: June, 1999
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438 /   HD   SEMICONDUCTOR DEVICE MANUFACTURING: PROCESS

942  DF  MASKING {6}
948  DF  .~ Radiation resist {4}
951.~.~ Lift-off

DEFINITION

Classification: 438/951

Lift-off

Art collection under 948 involving the selective removal of a deposited layer by striping off the radiation resist and portions of the deposited layer residing thereupon.