US PATENT SUBCLASS 438 / 952
.~.~ Utilizing antireflective layer

Current as of: June, 1999
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438 /   HD   SEMICONDUCTOR DEVICE MANUFACTURING: PROCESS

942  DF  MASKING {6}
948  DF  .~ Radiation resist {4}
952.~.~ Utilizing antireflective layer

DEFINITION

Classification: 438/952

Utilizing antireflective layer

Art collection under 948 involving the use of an antireflective layer on the semiconductor substrate.