438 / | HD | SEMICONDUCTOR DEVICE MANUFACTURING: PROCESS |
758 | DF | COATING OF SUBSTRATE CONTAINING SEMICONDUCTOR REGION OR OF SEMICONDUCTOR SUBSTRATE {6} |
765 | DF | .~ By reaction with substrate {4} |
769 | DF | .~.~ Reaction with silicon semiconductive region (e.g., oxynitride formation, etc.) {2} |
775 | DF | .~.~.~ Nitridation {1} |
776 | .~.~.~.~ Using electromagnetic or wave energy {1} | |
777 | DF | .~.~.~.~.~> Microwave gas energizing |