US PATENT SUBCLASS 438 / 769
.~.~ Reaction with silicon semiconductive region (e.g., oxynitride formation, etc.)

Current as of: June, 1999
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438 /   HD   SEMICONDUCTOR DEVICE MANUFACTURING: PROCESS

758  DF  COATING OF SUBSTRATE CONTAINING SEMICONDUCTOR REGION OR OF SEMICONDUCTOR SUBSTRATE {6}
765  DF  .~ By reaction with substrate {4}
769.~.~ Reaction with silicon semiconductive region (e.g., oxynitride formation, etc.) {2}
770  DF  .~.~.~> Oxidation {3}
775  DF  .~.~.~> Nitridation {1}

DEFINITION

Classification: 438/769

Reaction with silicon semiconductive region (e.g., oxynitride formation, etc.):

(under subclass 765) Processes wherein the substrate region reacting with an external agent is a silicon semiconductor region.