| 438 / | HD | SEMICONDUCTOR DEVICE MANUFACTURING: PROCESS |
| 758 | DF | COATING OF SUBSTRATE CONTAINING SEMICONDUCTOR REGION OR OF SEMICONDUCTOR SUBSTRATE {6} |
| 765 | DF | .~ By reaction with substrate {4} |
| 769 | DF | .~.~ Reaction with silicon semiconductive region (e.g., oxynitride formation, etc.) {2} |
| 770 | | .~.~.~ Oxidation {3} |
| 771 | DF | .~.~.~.~> Using electromagnetic or wave energy {1} |
| 773 | DF | .~.~.~.~> In atmosphere containing water vapor (i.e., wet oxidation) |
| 774 | DF | .~.~.~.~> In atmosphere containing halogen |