US PATENT SUBCLASS 438 / 773
.~.~.~.~ In atmosphere containing water vapor (i.e., wet oxidation)

Current as of: June, 1999
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438 /   HD   SEMICONDUCTOR DEVICE MANUFACTURING: PROCESS

758  DF  COATING OF SUBSTRATE CONTAINING SEMICONDUCTOR REGION OR OF SEMICONDUCTOR SUBSTRATE {6}
765  DF  .~ By reaction with substrate {4}
769  DF  .~.~ Reaction with silicon semiconductive region (e.g., oxynitride formation, etc.) {2}
770  DF  .~.~.~ Oxidation {3}
773.~.~.~.~ In atmosphere containing water vapor (i.e., wet oxidation)

DEFINITION

Classification: 438/773

In atmosphere containing water vapor (i.e., wet oxidation):

(under subclass 770) Processes wherein the oxidation is carried out in an atmosphere containing water in vaporous form.