US PATENT SUBCLASS 438 / 775
.~.~.~ Nitridation

Current as of: June, 1999
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438 /   HD   SEMICONDUCTOR DEVICE MANUFACTURING: PROCESS

758  DF  COATING OF SUBSTRATE CONTAINING SEMICONDUCTOR REGION OR OF SEMICONDUCTOR SUBSTRATE {6}
765  DF  .~ By reaction with substrate {4}
769  DF  .~.~ Reaction with silicon semiconductive region (e.g., oxynitride formation, etc.) {2}
775.~.~.~ Nitridation {1}
776  DF  .~.~.~.~> Using electromagnetic or wave energy {1}

DEFINITION

Classification: 438/775

Nitridation:

(under subclass 769) Processes wherein the external agent supplies nitrogen which reacts with the silicon substrate region to form a compound therewith.