| 438 / | HD | SEMICONDUCTOR DEVICE MANUFACTURING: PROCESS |
| 689 | DF | CHEMICAL ETCHING {6} |
| 706 | DF | .~ Vapor phase etching (i.e., dry etching) {3} |
| 707 | | .~.~ Utilizing electromagnetic or wave energy {3} |
| 708 | DF | .~.~.~> Photo-induced etching {1} |
| 710 | DF | .~.~.~> By creating electric field (e.g., plasma, glow discharge, etc.) {17} |
| 733 | DF | .~.~.~> Using or orientation dependent etchant (i.e., anisotropic etchant) |