US PATENT SUBCLASS 438 / 708
.~.~.~ Photo-induced etching

Current as of: June, 1999
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438 /   HD   SEMICONDUCTOR DEVICE MANUFACTURING: PROCESS

689  DF  CHEMICAL ETCHING {6}
706  DF  .~ Vapor phase etching (i.e., dry etching) {3}
707  DF  .~.~ Utilizing electromagnetic or wave energy {3}
708.~.~.~ Photo-induced etching {1}
709  DF  .~.~.~.~> Photo-induced plasma etching

DEFINITION

Classification: 438/708

Photo-induced etching:

(under subclass 707) Processes involving the simultaneous irradiation of the substrate or adjoining space with infrared, visible, or ultraviolet radiation to induce the vapor phase etching of regions thereof.