438 / | HD | SEMICONDUCTOR DEVICE MANUFACTURING: PROCESS |
142 | DF | MAKING FIELD EFFECT DEVICE HAVING PAIR OF ACTIVE REGIONS SEPARATED BY GATE STRUCTURE BY FORMATION OR ALTERATION OF SEMICONDUCTIVE ACTIVE REGIONS {6} |
197 | DF | .~ Having insulated gate (e.g., IGFET, MISFET, MOSFET, etc.) {24} |
199 | DF | .~.~ Complementary insulated gate field effect transistors (i.e., CMOS) {11} |
200 | DF | .~.~.~ And additional electrical device {4} |
202 | DF | .~.~.~.~ Including bipolar transistor (i.e., BiCMOS) {5} |
204 | .~.~.~.~.~ Lateral bipolar transistor |