US PATENT SUBCLASS 216 / 70
.~.~.~.~ Magnetically enhancing the plasma

Current as of: June, 1999
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216 /   HD   ETCHING A SUBSTRATE: PROCESSES

58  DF  GAS PHASE ETCHING OF SUBSTRATE {6}
63  DF  .~ Application of energy to the gaseous etchant or to the substrate being etched {4}
67  DF  .~.~ Using plasma {3}
69  DF  .~.~.~ Using microwave to generate the plasma {1}
70.~.~.~.~ Magnetically enhancing the plasma

DEFINITION

Classification: 216/70

Magnetically enhancing the plasma:

(under subclass 69) Process where the plasma is intensified by the use of a magnetic field.

(1) Note. The magnetic field establishes a resonant motion of the electrons in the chamber.