US PATENT SUBCLASS 438 / 751
.~.~.~.~ Each etch step exposes surface of an adjacent layer

Current as of: June, 1999
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438 /   HD   SEMICONDUCTOR DEVICE MANUFACTURING: PROCESS

689  DF  CHEMICAL ETCHING {6}
745  DF  .~ Liquid phase etching {9}
749  DF  .~.~ Sequential application of etchant {1}
750  DF  .~.~.~ To same side of substrate {1}
751.~.~.~.~ Each etch step exposes surface of an adjacent layer

DEFINITION

Classification: 438/751

Each etch step exposes surface of an adjacent layer:

(under subclass 750) Processes wherein a layer on the semiconductor substrate previously covered by a different layer is exposed by each liquid phase etching step.