US PATENT SUBCLASS 438 / 743
.~.~.~.~ Silicon oxide or glass

Current as of: June, 1999
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438 /   HD   SEMICONDUCTOR DEVICE MANUFACTURING: PROCESS

689  DF  CHEMICAL ETCHING {6}
706  DF  .~ Vapor phase etching (i.e., dry etching) {3}
735  DF  .~.~ Differential etching of semiconductor substrate {2}
737  DF  .~.~.~ Substrate possessing multiple layers {4}
743.~.~.~.~ Silicon oxide or glass

DEFINITION

Classification: 438/743

Silicon oxide or glass:

(under subclass 737) Processes wherein the material undergoing etching with the energized gas is a compound of silicon and oxygen or glass.