US PATENT SUBCLASS 438 / 742
.~.~.~.~ Electrically conductive material (e.g., metal, conductive oxide, etc.)

Current as of: June, 1999
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438 /   HD   SEMICONDUCTOR DEVICE MANUFACTURING: PROCESS

689  DF  CHEMICAL ETCHING {6}
706  DF  .~ Vapor phase etching (i.e., dry etching) {3}
735  DF  .~.~ Differential etching of semiconductor substrate {2}
737  DF  .~.~.~ Substrate possessing multiple layers {4}
742.~.~.~.~ Electrically conductive material (e.g., metal, conductive oxide, etc.)

DEFINITION

Classification: 438/742

Electrically conductive material (e.g., metal, conductive oxide, etc.):

(under subclass 737) Processes wherein the material undergoing etching with the energized gas is an electrically conductive material.