US PATENT SUBCLASS 438 / 715
.~.~.~.~ With substrate heating or cooling

Current as of: June, 1999
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438 /   HD   SEMICONDUCTOR DEVICE MANUFACTURING: PROCESS

689  DF  CHEMICAL ETCHING {6}
706  DF  .~ Vapor phase etching (i.e., dry etching) {3}
707  DF  .~.~ Utilizing electromagnetic or wave energy {3}
710  DF  .~.~.~ By creating electric field (e.g., plasma, glow discharge, etc.) {17}
715.~.~.~.~ With substrate heating or cooling

DEFINITION

Classification: 438/715

With substrate heating or cooling:

(under subclass 710) Processes including the temperature maintenance or modification of the semiconductor substrate during the etching thereof with the energized gas.