US PATENT SUBCLASS 438 / 627
.~.~.~.~.~ At least one layer forms a diffusion barrier

Current as of: June, 1999
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438 /   HD   SEMICONDUCTOR DEVICE MANUFACTURING: PROCESS

584  DF  COATING WITH ELECTRICALLY OR THERMALLY CONDUCTIVE MATERIAL {2}
597  DF  .~ To form ohmic contact to semiconductive material {24}
618  DF  .~.~ Contacting multiple semiconductive regions (i.e., interconnects) {5}
622  DF  .~.~.~ Multiple metal levels, separated by insulating layer (i.e., multiple level metallization) {8}
625  DF  .~.~.~.~ At least one metallization level formed of diverse conductive layers {4}
627.~.~.~.~.~ At least one layer forms a diffusion barrier

DEFINITION

Classification: 438/627

At least one layer forms a diffusion barrier:

(under subclass 625) Processes wherein at least one of the diverse conductive layers forms a barrier to the migration of a contact material into the semiconductor or into another contact layer.