438 / | HD | SEMICONDUCTOR DEVICE MANUFACTURING: PROCESS |
|
584 | DF | COATING WITH ELECTRICALLY OR THERMALLY CONDUCTIVE MATERIAL {2} |
597 | DF | .~ To form ohmic contact to semiconductive material {24} |
618 | | .~.~ Contacting multiple semiconductive regions (i.e., interconnects) {5} |
619 | DF | .~.~.~> Air bridge structure |
620 | DF | .~.~.~> Forming contacts of differing depths into semiconductor substrate |
621 | DF | .~.~.~> Contacting diversely doped semiconductive regions (e.g., p-type and n-type regions, etc.) |
622 | DF | .~.~.~> Multiple metal levels, separated by insulating layer (i.e., multiple level metallization) {8} |
642 | DF | .~.~.~> Diverse conductors {6} |