US PATENT SUBCLASS 438 / 371
.~.~.~ Simultaneous introduction of plural dopants

Current as of: June, 1999
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438 /   HD   SEMICONDUCTOR DEVICE MANUFACTURING: PROCESS

309  DF  FORMING BIPOLAR TRANSISTOR BY FORMATION OR ALTERATION OF SEMICONDUCTIVE ACTIVE REGIONS {25}
364  DF  .~ Self-aligned {2}
369  DF  .~.~ Dopant implantation or diffusion {2}
371.~.~.~ Simultaneous introduction of plural dopants {1}
372  DF  .~.~.~.~> Plural doping steps {4}

DEFINITION

Classification: 438/371

Simultaneous introduction of plural dopants:

(under subclass 369) Process involving the concurrent introduction of multiple dopant species into one or more semiconductive regions of the substrate.