US PATENT SUBCLASS 438 / 364
.~ Self-aligned


Current as of: June, 1999
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438 /   HD   SEMICONDUCTOR DEVICE MANUFACTURING: PROCESS

309  DF  FORMING BIPOLAR TRANSISTOR BY FORMATION OR ALTERATION OF SEMICONDUCTIVE ACTIVE REGIONS {25}
364.~ Self-aligned {2}
365  DF  .~.~> Forming active region from adjacent doped polycrystalline or amorphous semiconductor {2}
369  DF  .~.~> Dopant implantation or diffusion {2}


DEFINITION

Classification: 438/364

Self-aligned:

(under subclass 309) Process wherein a previously formed device feature is utilized to make device regions in the desired registration to the previously formed feature.