438 / | HD | SEMICONDUCTOR DEVICE MANUFACTURING: PROCESS |
142 | DF | MAKING FIELD EFFECT DEVICE HAVING PAIR OF ACTIVE REGIONS SEPARATED BY GATE STRUCTURE BY FORMATION OR ALTERATION OF SEMICONDUCTIVE ACTIVE REGIONS {6} |
197 | DF | .~ Having insulated gate (e.g., IGFET, MISFET, MOSFET, etc.) {24} |
257 | DF | .~.~ Having additional gate electrode surrounded by dielectric (i.e., floating gate) {8} |
262 | DF | .~.~.~ Including elongated source or drain region disposed under thick oxide regions (e.g., buried or diffused bitline, etc.) {1} |
263 | .~.~.~.~ Tunneling insulator |