US PATENT SUBCLASS 438 / 210
.~.~.~.~ Including passive device (e.g., resistor, capacitor, etc.)

Current as of: June, 1999
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438 /   HD   SEMICONDUCTOR DEVICE MANUFACTURING: PROCESS

142  DF  MAKING FIELD EFFECT DEVICE HAVING PAIR OF ACTIVE REGIONS SEPARATED BY GATE STRUCTURE BY FORMATION OR ALTERATION OF SEMICONDUCTIVE ACTIVE REGIONS {6}
197  DF  .~ Having insulated gate (e.g., IGFET, MISFET, MOSFET, etc.) {24}
199  DF  .~.~ Complementary insulated gate field effect transistors (i.e., CMOS) {11}
200  DF  .~.~.~ And additional electrical device {4}
210.~.~.~.~ Including passive device (e.g., resistor, capacitor, etc.)

DEFINITION

Classification: 438/210

Including passive device (e.g., resistor, capacitor, etc.):

(under subclass 200) Process for making complementary insulated gate field effect transistors having combined therewith a passive electrical device or element (i.e., an electrical device or component in which charge carriers do not change their energy levels and do not provide electrical rectification, amplification, or switching, but which does react to voltage and current input).