US PATENT SUBCLASS 216 / 84
.~ With measuring, testing, or inspecting

Current as of: June, 1999
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216 /   HD   ETCHING A SUBSTRATE: PROCESSES

83  DF  NONGASEOUS PHASE ETCHING OF SUBSTRATE {9}
84.~ With measuring, testing, or inspecting {2}
85  DF  .~.~> By optical means or of an optical property
86  DF  .~.~> By electrical means or of an electrical property

DEFINITION

Classification: 216/84

With measuring, testing, or inspecting:

(under subclass 83) Process including the step of visually, chemically, or physically determining or measuring a variable condition or property of the substrate or the etching process.

(1) Note. Included hereunder is a process of monitoring or controlling the etching process in response to a sensed condition.

SEE OR SEARCH THIS CLASS, SUBCLASS:

59, for measuring testing, inspecting, monitoring, or controlling of gas phase etching.

93, for recycling, regenerating, or rejuvenating an etchant including a testing, measuring, inspecting, monitoring, or controlling step.

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445, Electric Lamp or Space Discharge Component or Device Manufacturing,

3, for testing or adjusting.