US PATENT SUBCLASS 216 / 85
.~.~ By optical means or of an optical property

Current as of: June, 1999
Click HD for Main Headings
Click for All Classes

Internet Version by PATENTEC © 1999      Terms of Use


216 /   HD   ETCHING A SUBSTRATE: PROCESSES

83  DF  NONGASEOUS PHASE ETCHING OF SUBSTRATE {9}
84  DF  .~ With measuring, testing, or inspecting {2}
85.~.~ By optical means or of an optical property

DEFINITION

Classification: 216/85

By optical means or of an optical property:

(under subclass 84) Process where the test is performed optically or determines an optical property, e.g., reflectance, etc.