US PATENT SUBCLASS 216 / 80
.~.~.~ Silicon containing substrate is glass

Current as of: June, 1999
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216 /   HD   ETCHING A SUBSTRATE: PROCESSES

58  DF  GAS PHASE ETCHING OF SUBSTRATE {6}
74  DF  .~ Etching inorganic substrate {3}
79  DF  .~.~ Etching silicon containing substrate {1}
80.~.~.~ Silicon containing substrate is glass

DEFINITION

Classification: 216/80

Silicon containing substrate is glass:

(under subclass 79) Process wherein the material is composed of glass.

(1) Note. See Glossary for a definition of the term Glass.

SEE OR SEARCH CLASS

65, Glass Manufacturing

31, for etching or leaching of a glass preform, made by a Class 65 glass manufacturing method, e.g., molding, shaping, etc. of the glass in a plastic or softened state by heating,

subclass 61 for wearing away of surface material, e.g., abrading or grinding, etc.