US PATENT SUBCLASS 216 / 59
.~ With measuring, testing, or inspecting

Current as of: June, 1999
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216 /   HD   ETCHING A SUBSTRATE: PROCESSES

58  DF  GAS PHASE ETCHING OF SUBSTRATE {6}
59.~ With measuring, testing, or inspecting {2}
60  DF  .~.~> By optical means or of an optical property
61  DF  .~.~> By electrical means or of an electrical property

DEFINITION

Classification: 216/59

With measuring, testing, or inspecting:

(under subclass 58) Process including the step of visually, chemically, or physically determining or measuring a variable condition or property of the substrate or the etching process.

(1) Note. Included here under is a process of monitoring or controlling the etching process in response to a sensed condition.

SEE OR SEARCH THIS CLASS, SUBCLASS:

84+, for measuring, testing, inspecting, monitoring or controlling of a nongaseous phase etching process.

SEE OR SEARCH CLASS

445, Electric Lamp or Space Discharge Component or Device Manufacturing,

3, for testing or adjusting.