US PATENT SUBCLASS 216 / 60
.~.~ By optical means or of an optical property

Current as of: June, 1999
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216 /   HD   ETCHING A SUBSTRATE: PROCESSES

58  DF  GAS PHASE ETCHING OF SUBSTRATE {6}
59  DF  .~ With measuring, testing, or inspecting {2}
60.~.~ By optical means or of an optical property

DEFINITION

Classification: 216/60

By optical means or of an optical property:

(under subclass 59) Process where the test is performed optically or determines an optical property, e.g., reflectance, etc.