US PATENT SUBCLASS 216 / 102
.~.~.~ Metal is elemental aluminum, an alloy, or compound thereof

Current as of: June, 1999
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216 /   HD   ETCHING A SUBSTRATE: PROCESSES

83  DF  NONGASEOUS PHASE ETCHING OF SUBSTRATE {9}
96  DF  .~ Etching inorganic substrate {3}
100  DF  .~.~ Substrate contains elemental metal, alloy thereof, or metal compound {4}
102.~.~.~ Metal is elemental aluminum, an alloy, or compound thereof {1}
103  DF  .~.~.~.~> Etchant contains acid {1}

DEFINITION

Classification: 216/102

Metal is elemental aluminum, an alloy, or compound thereof:

(under subclass 100) Process wherein the substrate etched contains elemental aluminum, its alloys, or a compound thereof.