204 / | HD | CHEMISTRY: ELECTRICAL AND WAVE ENERGY |
193 | DF | APPARATUS {5} |
298.01 | DF | .~ Coating, forming or etching by sputtering {2} |
298.02 | DF | .~.~ Coating {13} |
298.16 | DF | .~.~.~ Magnetically enchanced {1} |
298.17 | DF | .~.~.~.~ Flux passes through target surface {3} |
298.21 | DF | .~.~.~.~.~ Cylindrical or curved magnetron target {1} |
298.22 | ![]() | .~.~.~.~.~.~ Moving magnetic field or target |