204 / | HD | CHEMISTRY: ELECTRICAL AND WAVE ENERGY |
193 | DF | APPARATUS {5} |
298.01 | DF | .~ Coating, forming or etching by sputtering {2} |
298.02 | DF | .~.~ Coating {13} |
298.16 | DF | .~.~.~ Magnetically enchanced {1} |
298.17 | .~.~.~.~ Flux passes through target surface {3} | |
298.18 | DF | .~.~.~.~.~> Focusing target (e.g., conical target, plural inclined targets, etc.) |
298.19 | DF | .~.~.~.~.~> Planar magnetron {1} |
298.21 | DF | .~.~.~.~.~> Cylindrical or curved magnetron target {1} |