| 204 / | HD | CHEMISTRY: ELECTRICAL AND WAVE ENERGY |
| 193 | DF | APPARATUS {5} |
| 298.01 | DF | .~ Coating, forming or etching by sputtering {2} |
| 298.02 | DF | .~.~ Coating {13} |
| 298.16 | DF | .~.~.~ Magnetically enchanced {1} |
| 298.17 | ![]() | .~.~.~.~ Flux passes through target surface {3} |
| 298.18 | DF | .~.~.~.~.~> Focusing target (e.g., conical target, plural inclined targets, etc.) |
| 298.19 | DF | .~.~.~.~.~> Planar magnetron {1} |
| 298.21 | DF | .~.~.~.~.~> Cylindrical or curved magnetron target {1} |