US PATENT SUBCLASS 204 / 298.16
.~.~.~ Magnetically enchanced


Current as of: June, 1999
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204 /   HD   CHEMISTRY: ELECTRICAL AND WAVE ENERGY

193  DF  APPARATUS {5}
298.01  DF  .~ Coating, forming or etching by sputtering {2}
298.02  DF  .~.~ Coating {13}
298.16.~.~.~ Magnetically enchanced {1}
298.17  DF  .~.~.~.~> Flux passes through target surface {3}


DEFINITION

Classification: 204/298.16

Magnetically enhanced:

(under subclass 298.02) Apparatus including significant means for magnetic enhancement of target sputtering, plasma shaping or confinement, or control of deposition parameters or deposit characteristics.

(1) Note. The means for magnetic enhancement may be either inside or outside the chamber utilized in creating the vacuum.

(2) Note. Apparatus in which magnetic means are merely nominally specified are not included herein.