US PATENT SUBCLASS 438 / 788
.~.~.~ Using electromagnetic or wave energy (e.g., photo-induced deposition, plasma, etc.)

Current as of: June, 1999
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438 /   HD   SEMICONDUCTOR DEVICE MANUFACTURING: PROCESS

758  DF  COATING OF SUBSTRATE CONTAINING SEMICONDUCTOR REGION OR OF SEMICONDUCTOR SUBSTRATE {6}
778  DF  .~ Insulative material deposited upon semiconductive substrate {8}
787  DF  .~.~ Silicon oxide formation {2}
788.~.~.~ Using electromagnetic or wave energy (e.g., photo-induced deposition, plasma, etc.) {1}
789  DF  .~.~.~.~> Organic reactant

DEFINITION

Classification: 438/788

Using electromagnetic or wave energy (e.g., photo-induced deposition, plasma, etc.):

(under subclass 787) Processes wherein the silicon oxide is deposited using irradiation of electromagnetic or wave energy.