US PATENT SUBCLASS 438 / 784
.~.~.~ Introduction simultaneous with deposition

Current as of: June, 1999
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438 /   HD   SEMICONDUCTOR DEVICE MANUFACTURING: PROCESS

758  DF  COATING OF SUBSTRATE CONTAINING SEMICONDUCTOR REGION OR OF SEMICONDUCTOR SUBSTRATE {6}
778  DF  .~ Insulative material deposited upon semiconductive substrate {8}
783  DF  .~.~ Insulative material having impurity (e.g., for altering physical characteristics, etc.) {1}
784.~.~.~ Introduction simultaneous with deposition

DEFINITION

Classification: 438/784

Introduction simultaneous with deposition:

(under subclass 783) Processes wherein the impurity is introduced into the insulative material concurrently with the deposition step.