US PATENT SUBCLASS 438 / 783
.~.~ Insulative material having impurity (e.g., for altering physical characteristics, etc.)

Current as of: June, 1999
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438 /   HD   SEMICONDUCTOR DEVICE MANUFACTURING: PROCESS

758  DF  COATING OF SUBSTRATE CONTAINING SEMICONDUCTOR REGION OR OF SEMICONDUCTOR SUBSTRATE {6}
778  DF  .~ Insulative material deposited upon semiconductive substrate {8}
783.~.~ Insulative material having impurity (e.g., for altering physical characteristics, etc.) {1}
784  DF  .~.~.~> Introduction simultaneous with deposition

DEFINITION

Classification: 438/783

Insulative material having impurity (e.g., for altering

physical characteristics, etc.):

(under subclass 778) Processes wherein the deposited insulative material contains one or more impurities (e.g., for altering a physical characteristic such as etchability, for serving as a diffusion source for adjacent semiconductive regions of the substrate, etc.).