US PATENT SUBCLASS 438 / 72
.~.~.~ Having reflective or antireflective component

Current as of: June, 1999
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438 /   HD   SEMICONDUCTOR DEVICE MANUFACTURING: PROCESS

48  DF  MAKING DEVICE OR CIRCUIT RESPONSIVE TO NONELECTRICAL SIGNAL {5}
57  DF  .~ Responsive to electromagnetic radiation {22}
69  DF  .~.~ Including integrally formed optical element (e.g., reflective layer, luminescent layer, etc.) {3}
72.~.~.~ Having reflective or antireflective component

DEFINITION

Classification: 438/72

Having reflective or antireflective component:

(under subclass 69) Process for making a semiconductor device responsive to electromagnetic radiation having a component which has reflective or antireflective properties with

respect to electromagnetic radiation incident thereupon.