US PATENT SUBCLASS 438 / 69
.~.~ Including integrally formed optical element (e.g., reflective layer, luminescent layer, etc.)

Current as of: June, 1999
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438 /   HD   SEMICONDUCTOR DEVICE MANUFACTURING: PROCESS

48  DF  MAKING DEVICE OR CIRCUIT RESPONSIVE TO NONELECTRICAL SIGNAL {5}
57  DF  .~ Responsive to electromagnetic radiation {22}
69.~.~ Including integrally formed optical element (e.g., reflective layer, luminescent layer, etc.) {3}
70  DF  .~.~.~> Color filter
71  DF  .~.~.~> Specific surface topography (e.g., textured surface, etc.)
72  DF  .~.~.~> Having reflective or antireflective component

DEFINITION

Classification: 438/69

Including integrally formed optical element (e.g., reflective layer, luminescent layer, etc.):

(under subclass 57) Process for making a semiconductor device responsive to electromagnetic radiation wherein the device has combined therewith one or more integrally formed optical elements to transmit or modify electromagnetic radiation incident upon the semiconductor device