US PATENT SUBCLASS 438 / 663
.~.~.~ Rapid thermal anneal

Current as of: June, 1999
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438 /   HD   SEMICONDUCTOR DEVICE MANUFACTURING: PROCESS

584  DF  COATING WITH ELECTRICALLY OR THERMALLY CONDUCTIVE MATERIAL {2}
597  DF  .~ To form ohmic contact to semiconductive material {24}
660  DF  .~.~ Including heat treatment of conductive layer {2}
663.~.~.~ Rapid thermal anneal {1}
664  DF  .~.~.~.~> Forming silicide

DEFINITION

Classification: 438/663

Rapid thermal anneal:

(under subclass 660) Processes wherein the heat treatment is of sufficiently short time span so as to limit the thermal affects primarily to the electrically conductive layer.