US PATENT SUBCLASS 438 / 506
.~.~.~ Ion implantation

Current as of: June, 1999
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438 /   HD   SEMICONDUCTOR DEVICE MANUFACTURING: PROCESS

478  DF  FORMATION OF SEMICONDUCTIVE ACTIVE REGION ON ANY SUBSTRATE (E.G., FLUID GROWTH, DEPOSITION) {9}
503  DF  .~ Fluid growth from gaseous state combined with preceding diverse operation {2}
505  DF  .~.~ Doping of semiconductor {1}
506.~.~.~ Ion implantation

DEFINITION

Classification: 438/506

Ion implantation:

(under subclass 505) Process wherein the doping is by implantation of dopant ions into the semiconductor regions of the substrate.