US PATENT SUBCLASS 438 / 505
.~.~ Doping of semiconductor

Current as of: June, 1999
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438 /   HD   SEMICONDUCTOR DEVICE MANUFACTURING: PROCESS

478  DF  FORMATION OF SEMICONDUCTIVE ACTIVE REGION ON ANY SUBSTRATE (E.G., FLUID GROWTH, DEPOSITION) {9}
503  DF  .~ Fluid growth from gaseous state combined with preceding diverse operation {2}
505.~.~ Doping of semiconductor {1}
506  DF  .~.~.~> Ion implantation

DEFINITION

Classification: 438/505

Doping of semiconductor:

(under subclass 503) Process wherein a semiconductive region of the substrate is incorporated with an electrically active dopant species prior to a step of fluid growth of semiconductive material from the vapor or gaseous state.