| 438 / | HD | SEMICONDUCTOR DEVICE MANUFACTURING: PROCESS |
| 478 | DF | FORMATION OF SEMICONDUCTIVE ACTIVE REGION ON ANY SUBSTRATE (E.G., FLUID GROWTH, DEPOSITION) {9} |
| 482 | | .~ Amorphous semiconductor {4} |
| 483 | DF | .~.~> Compound semiconductor |
| 484 | DF | .~.~> Running length (e.g., sheet, strip, etc.) |
| 485 | DF | .~.~> Deposition utilizing plasma (e.g., glow discharge, etc.) |
| 486 | DF | .~.~> And subsequent crystallization {1} |