US PATENT SUBCLASS 438 / 482
.~ Amorphous semiconductor


Current as of: June, 1999
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438 /   HD   SEMICONDUCTOR DEVICE MANUFACTURING: PROCESS

478  DF  FORMATION OF SEMICONDUCTIVE ACTIVE REGION ON ANY SUBSTRATE (E.G., FLUID GROWTH, DEPOSITION) {9}
482.~ Amorphous semiconductor {4}
483  DF  .~.~> Compound semiconductor
484  DF  .~.~> Running length (e.g., sheet, strip, etc.)
485  DF  .~.~> Deposition utilizing plasma (e.g., glow discharge, etc.)
486  DF  .~.~> And subsequent crystallization {1}


DEFINITION

Classification: 438/482

Amorphous semiconductor:

(under subclass 478) Process wherein the deposited semiconductive material possesses no regular crystalline lattice.